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LT-014135 / first seen 2026-08-27 16:06 / last activity 14d ago solid / under-covered

Current status of atomic layer etching and its adoption to low-k fine patterning: An industrial perspective

measurement

heat
13 / 100 (raw 0.3)
velocity
0.0 independent sources per hour
solidity
80 / 100
sources
1 total, 1 independent
domain span
1 domain covered it

primary source

title
Current status of atomic layer etching and its adoption to low-k fine patterning: An industrial perspective
venue
status
peer-reviewed
doi
10.1116/6.0005592
published
2026-08-25

media coverage / 1 outlets